Search Constraints
Search Results
Select an image to start the slideshow
Plasma-free dry etching of (001) β-Ga2O3 substrates by HCl gas
1 of 3
Materials issues and devices of α- and β-Ga2O3
2 of 3
Selective area growth of β-Ga2O3 by HCl-based halide vapor phase epitaxy
3 of 3