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Filtering by: Author Ashutosh Kumar Journal JOURNAL OF APPLIED PHYSICS Type of work Publication Publisher AIP Publishing

Acceptor activation of Mg-doped GaN—Effects of N2/O2 vs N2 as ambient gas during annealing

Description/Abstract:

Here, we investigate the effects of O2:N2 (1:1) as ambient gas as compared with pure N2 during activation annealing of Mg as p-type dopin...

Keyword:

activation, gallium nitride, scanning transmission electron microscopy, and semiconductor

Resource Type:

Article

Author:

Ashutosh Kumar, Martin Berg, Qin Wang, Jun Uzuhashi, Tadakatsu Ohkubo, Michael Salter, and Peter Ramvall

Journal:

JOURNAL OF APPLIED PHYSICS

Date Uploaded:

28/09/2023

Date Modified:

28/09/2023
Atomic-scale investigation of implanted Mg in GaN through ultra-high-pressure annealing

Description/Abstract:

An area selective doping via ion implantation is a key technology to realize gallium nitride (GaN) based energy-efficient power devices; ...

Keyword:

atom probe tomography, cathodoluminescence, gallium nitride, implantation, and scanning transmission electron microscopy

Resource Type:

Article

Author:

Jun Uzuhashi, Jun Chen, Ashutosh Kumar, Wei Yi, Tadakatsu Ohkubo, Ryo Tanaka, Shinya Takashima, Masaharu Edo, Kacper Sierakowski, Michal Bockowski, Hideki Sakurai, Tetsu Kachi, Takashi Sekiguchi, and Kazuhiro Hono

Journal:

JOURNAL OF APPLIED PHYSICS

Date Uploaded:

04/07/2023