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Ga2O3
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Self-aligned patterning on β-Ga2O3 substrates via backside-exposure photolithography
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Selective area growth of β-Ga2O3 by HCl-based halide vapor phase epitaxy
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α-Al2O3/Ga2O3 superlattices coherently grown on r-plane sapphire
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Fabrication of coherent γ-Al2O3/Ga2O3 superlattices on MgAl2O4 substrates
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Ga2O3
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Superlattice
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lithography
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selective area growth
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IOP Publishing
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Creative Commons BY-NC-ND Attribution-NonCommercial-NoDerivs 4.0 International
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Takayoshi Oshima
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Masaki Takeguchi
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Masataka Imura
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Yoshiko Nakayama
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Yuji Kato
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科研費
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APPLIED PHYSICS EXPRESS
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Applied Physics Express
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JAPANESE JOURNAL OF APPLIED PHYSICS
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