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Takayoshi Oshima
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Applied Physics Express
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Growth dynamics of selective-area-grown rutile-type SnO2 on TiO2 (110) substrate
Description/Abstract:
We demonstrated selective-area growth of r-SnO2 on a SiO2-masked r-TiO2 (110) substrate. The heteroepitaxy on a window started with a Vol...
Keyword:
SnO2
and
selective area growth
Resource Type:
Article
Author:
Hitoshi Takane
,
Takayoshi Oshima
,
Katsuhisa Tanaka
, and
Kentaro Kaneko
Journal:
Applied Physics Express
Date Uploaded:
13/04/2024
Rutile-type GexSn1−xO2 alloy layers lattice-matched to TiO2 substrates for device applications
Description/Abstract:
We report the characterization and application of mist-CVD-grown rutile-structured GexSn1−xO2 (x = ∼0.53) films lattice-matched to isostr...
Keyword:
GeO2
,
SnO2
, and
TiO2
Resource Type:
Article
Author:
Hitoshi Takane
,
Takayoshi Oshima
,
Takayuki Harada
,
Kentaro Kaneko
, and
Katsuhisa Tanaka
Journal:
Applied Physics Express
Date Uploaded:
30/01/2024
Date Modified:
01/02/2024
Selective area growth of β-Ga2O3 by HCl-based halide vapor phase epitaxy
Description/Abstract:
We demonstrated selective area growth of β-Ga2O3 by HCl-based halide vapor phase epitaxy on SiO2-masked (001) and (010) β-Ga2O3 substrate...
Keyword:
Ga2O3
and
selective area growth
Resource Type:
Article
Author:
Takayoshi Oshima
and
Yuichi Oshima
Journal:
Applied Physics Express
Date Uploaded:
28/11/2023
Date Modified:
28/11/2023
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SnO2
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selective area growth
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English
3
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IOP Publishing
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Creative Commons BY-NC-ND Attribution-NonCommercial-NoDerivs 4.0 International
2
Creative Commons BY Attribution 4.0 International
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Author
Takayoshi Oshima
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Hitoshi Takane
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Katsuhisa Tanaka
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Japan Science and Technology Agency (JST), the Establishment of University Fellowships toward the Creation of Science and Technology Innovation
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the Nippon Sheet Glass Foundation for Materials Science and Engineering
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日本板硝子材料工学助成会
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Journal
Applied Physics Express
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