Dataset: Using selective-area growth and selective-area etching on (−102) β-Ga2O3 substrates to fabricate plasma-damage-free vertical fins and trenches
Filename: 042110_1_5.0186319.pdf (サムネイル) Download
Content type: application/pdf
Size: 2.85MB
Checksum: ff8f42acc1dd5c63e135b0b7b606a393