2 件のレコードが見つかりました。
Interface engineering of HfO 2 -based ferroelectric devices for crystal phase control and enhanced ferroelectricity using atomic-layer-deposited ZrO 2 nucleation layers
- ジャーナル論文
- 著者
-
Takashi Onaya (author) (この著者で検索)
https://orcid.org/0000-0002-2710-8623
(unauthenticated)
National Institute for Materials Science
;
Toshihide Nabatame (author) (この著者で検索)National Institute for Materials Science
- キーワード
- atomic layer deposition, ferroelectric HfO2-based thin films, memory devices, interface engineering, crystal phase control
- 刊行年月日
- 2026-04-30
- 更新時刻
- 2026-07-13 17:01:06 +0900
Effects of Plasma Reactants on Atomic Layer Deposition of Lithium Phosphate and Lithium Phosphorus Oxynitride Electrolyte Films
- ジャーナル論文
- 著者
-
Tohru Tsuruoka (author) (この著者で検索)National Institute for Materials Science
;
Samapika Mallik (author) (この著者で検索)
https://orcid.org/0000-0001-9281-9416
(unauthenticated)
;
;Takuji Tsujita (author) (この著者で検索);Yuu Inatomi (author) (この著者で検索)Kazuya Terabe (author) (この著者で検索)National Institute for Materials Science
- キーワード
- atomic layer deposition, lithium phosphate, lithium phosphorus oxynitride, solid-state electrolyte, plasma reactant
- 刊行年月日
- 2024-06-25
- 更新時刻
- 2025-06-25 08:30:22 +0900