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From Mechanics to Electronics: Influence of ALD Interlayers on the Multiaxial Electro‐Mechanical Behavior of Metal–Oxide Bilayers
Article
Creator
Johanna Byloff
;
Vivek Devulapalli
;
Daniele Casari
;
Thomas E. J. Edwards
;
Claus O. W. Trost
;
Megan J. Cordill
;
Shuhel Altaf Husain
;
Pierre‐Olivier Renault
;
Damien Faurie
;
Barbara Putz
Keyword
atomic layer deposition
,
electromechanical properties
,
flexible polymer substrates
,
tensile testing
,
thin films
Date published
2025-11-27
Updated at
2026-01-20 11:54:44 +0900
Keyword
atomic layer deposition
(1)
electromechanical properties
(1)
flexible polymer substrates
(1)
tensile testing
(1)
thin films
(1)
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