1 record found.
HCl-gas etching of (001) β-Ga2O3 under oxygen supply
- Article
- Creator
-
Yuichi Oshima
;
Takayoshi Oshima
- Keyword
- Ga2O3, etching, plasma-free
- Date published
- 2025-12-31
- Updated at
- 2025-09-04 12:30:19 +0900