Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam

Journal article

Creator

Yoshikawa, Hideki (author) (Search by this author)

https://orcid.org/0000-0002-7389-8865

NIMS Researchers Directory SAMURAI

Yoshikawa, Hideki ;

Ogiwara, Toshiya (author) (Search by this author)

https://orcid.org/0000-0002-7376-6571

NIMS Researchers Directory SAMURAI

Ogiwara, Toshiya ;

Nagata, Takahiro (author) (Search by this author)

https://orcid.org/0000-0002-8591-2943

NIMS Researchers Directory SAMURAI

Nagata, Takahiro

Keyword

Auger Depth Profiling analysis, HfO2/Si, Ultra Low Angle Incidence Ion Beam

Date published

2019-03-07

Updated at

2024-01-05 22:11:28 +0900