Characteristics of β-Ga2O3/Al2O3/Pt capacitors with a Ga2O3 surface modified using the dummy-SiO2 process

Journal article

Creator

Toshihide Nabatame (author) (Search by this author)

https://orcid.org/0000-0002-5973-0230

Research Center for Materials Nanoarchitectonics (MANA), National Institute for Materials Science

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Toshihide Nabatame ;

Yoshihiro Irokawa (author) (Search by this author)

https://orcid.org/0000-0002-6531-4356

Research Center for Electronic and Optical Materials/Functional Materials Field/Ultra-wide Bandgap Semiconductors Group, National Institute for Materials Science

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Yoshihiro Irokawa ;

Tomomi Sawada (author) (Search by this author)

Research Center for Materials Nanoarchitectonics (MANA)/Semiconductor Materials Field/Thin Film Electronics Group, National Institute for Materials Science

Tomomi Sawada ;

Hiromi Miura (author) (Search by this author)

Research Center for Materials Nanoarchitectonics (MANA)/Semiconductor Materials Field/Thin Film Electronics Group, National Institute for Materials Science

Hiromi Miura ;

Manami Miyamoto (author) (Search by this author)

Research Center for Materials Nanoarchitectonics (MANA)/Semiconductor Materials Field/Thin Film Electronics Group, National Institute for Materials Science

Manami Miyamoto ;

Takashi Onaya (author) (Search by this author)

https://orcid.org/0000-0002-2710-8623 (unauthenticated)

Research Center for Materials Nanoarchitectonics (MANA)/Semiconductor Materials Field/Thin Film Electronics Group, National Institute for Materials Science

Takashi Onaya ;

Yasuo Koide (author) (Search by this author)

https://orcid.org/0000-0001-8321-9822

Research Center for Electronic and Optical Materials/Functional Materials Field/Next-generation Semiconductor Group, National Institute for Materials Science

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Yasuo Koide ;

Kazuhito Tsukagoshi (author) (Search by this author)

https://orcid.org/0000-0001-9710-2692

Research Center for Materials Nanoarchitectonics (MANA)/Semiconductor Materials Field/Thin Film Electronics Group, National Institute for Materials Science

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Kazuhito Tsukagoshi

Keyword

Ga2O3, atomic layer deposition, dummy-SiO2, Al2O3, positive bias stress

Date published

2026-06-01

Updated at

2026-08-18 11:30:17 +0900