Plasma-free anisotropic selective-area etching of β-Ga ₂ O ₃ using forming gas under atmospheric pressure

Journal article

Creator

Takayoshi Oshima (author) (Search by this author)

https://orcid.org/0000-0001-8550-9735

NIMS Researchers Directory SAMURAI

Takayoshi Oshima ;

Rie Togashi (author) (Search by this author)

https://orcid.org/0000-0002-9467-0755 (unauthenticated)

Rie Togashi ;

Yuichi Oshima (author) (Search by this author)

https://orcid.org/0000-0001-8293-4891

NIMS Researchers Directory SAMURAI

Yuichi Oshima

Keyword

Ga2O3, forming gas, anisotropic etching, plasma-free process

Date published

2024-12-31

Updated at

2024-07-31 12:30:20 +0900