Oxygen-pressure driven balancing of interface and bulk scattering in amorphous oxide semiconductor thin-film transistors

Journal article

Creator

Che-Yi Lin (author) (Search by this author)

Che-Yi Lin ;

Yu-Ching Kuo (author) (Search by this author)

https://orcid.org/0009-0008-1978-4016 (unauthenticated)

Yu-Ching Kuo ;

I-Chen Liu (author) (Search by this author)

I-Chen Liu ;

Feng-Shou Yang (author) (Search by this author)

Feng-Shou Yang ;

Yuan-Ming Chang (author) (Search by this author)

Yuan-Ming Chang ;

Po-Wen Chiu (author) (Search by this author)

Po-Wen Chiu ;

Toshihide Nabatame (author) (Search by this author)

Toshihide Nabatame ;

Mengjiao Li (author) (Search by this author)

Mengjiao Li ;

Kazuhito Tsukagoshi (author) (Search by this author)

https://orcid.org/0000-0001-9710-2692

NIMS Researchers Directory SAMURAI

Kazuhito Tsukagoshi ;

Yen-Fu Lin (author) (Search by this author)

https://orcid.org/0000-0002-1545-9143 (unauthenticated)

Yen-Fu Lin

Keyword

Oxide, thin film, transistor

Date published

2025-09-05

Updated at

2025-09-26 17:46:31 +0900