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T. Oshima_Self-aligned patterning on β-Ga2O3 substrates via backside-exposure photolithography.docx
Self-aligned patterning on β-Ga2O3 substrates via backside-exposure photolithography
Article
Creator
Takayoshi Oshima SAMURAI ORCID
Keyword
Ga2O3, lithography
Date published
2023-01-01
Updated at
2024-01-24 11:20:15 +0900