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T. Oshima_Self-aligned patterning on β-Ga2O3 substrates via backside-exposure photolithography.docx
Self-aligned patterning on β-Ga2O3 substrates via backside-exposure photolithography
Journal article
Creator
Takayoshi Oshima (author) (Search by this author)
National Institute for Materials Science
ORCID SAMURAI
Keyword
Ga2O3, lithography
Date published
2023-01-01
Updated at
2024-01-24 11:20:15 +0900