Effects of oxidant selection for atomic layer deposition on impurity removal and crystallinity of as-grown Hf1− x Zr x O2 thin films

ジャーナル論文

著者

Haoming Che (author) (この著者で検索)

Haoming Che ;

Takashi Onaya (author) (この著者で検索)

https://orcid.org/0000-0002-2710-8623 (unauthenticated)

National Institute for Materials Science

Takashi Onaya ;

Atsushi Tamura (author) (この著者で検索)

Atsushi Tamura ;

Masaki Ishii (author) (この著者で検索)

Masaki Ishii ;

Hiroshi Taka (author) (この著者で検索)

Hiroshi Taka ;

Koji Kita (author) (この著者で検索)

Koji Kita

キーワード

atomic layer deposition, ferroelectric HfO2-based thin films, oxidant, low temperature fabrication process

刊行年月日

2026-05-01

更新時刻

2026-07-14 10:27:45 +0900