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HCl-gas etching behavior of 001 -Ga2O3 under oxygen supply.pdf
HCl-gas etching of (001) β-Ga2O3 under oxygen supply
Article
Creator
Yuichi Oshima SAMURAI ORCID ; Takayoshi Oshima SAMURAI ORCID
Keyword
Ga2O3, etching, plasma-free
Date published
2025-12-31
Updated at
2025-09-04 12:30:19 +0900