Nanolaminated Al100−Ni / AlO H thin films by hybrid PVD / ALD: An approach towards interface-engineered thin films by dual-route tailoring

Journal article

Creator

Hendrik C. Jansen (author) (Search by this author)

https://orcid.org/0009-0004-3513-4348 (unauthenticated)

Hendrik C. Jansen ;

Amit Sharma (author) (Search by this author)

Amit Sharma ;

Marcus Hans (author) (Search by this author)

https://orcid.org/0000-0002-1814-3101 (unauthenticated)

Marcus Hans ;

Jochen M Schneider (author) (Search by this author)

https://orcid.org/0000-0003-1239-1961 (unauthenticated)

Jochen M Schneider ;

Jakob Schwiedrzik (author) (Search by this author)

Jakob Schwiedrzik ;

Johann Michler (author) (Search by this author)

Johann Michler ;

Thomas E.J. Edwards (author) (Search by this author)

https://orcid.org/0000-0002-3089-0062

NIMS Researchers Directory SAMURAI

Thomas E.J. Edwards

Keyword

Interface-engineering, Hybrid PVD-ALD, Nanolaminated aluminium, Nanoclusters, Crystalline/amorphous interface, Nanoindentation

Date published

2026-01-30

Updated at

2026-04-10 18:08:28 +0900