ジャーナル論文 Nanolaminated Al100−Ni / AlO H thin films by hybrid PVD / ALD: An approach towards interface-engineered thin films by dual-route tailoring
Hendrik C. Jansen (author) (この著者で検索)
ORCID ;
Amit Sharma (author) (この著者で検索)
;
Marcus Hans (author) (この著者で検索)
ORCID ;
Jochen M Schneider (author) (この著者で検索)
ORCID ;
Jakob Schwiedrzik (author) (この著者で検索)
;
Johann Michler (author) (この著者で検索)
; ORCID SAMURAI
コレクション

引用
Hendrik C. Jansen, Amit Sharma, Marcus Hans, Jochen M Schneider, Jakob Schwiedrzik, Johann Michler, Thomas E.J. Edwards. Nanolaminated Al100−Ni / AlO H thin films by hybrid PVD / ALD: An approach towards interface-engineered thin films by dual-route tailoring. Materials & Design. 2026, 263 (), 115580. https://doi.org/10.1016/j.matdes.2026.115580

説明:

(abstract)

Hybrid physical vapour/atomic layer deposition technology has enabled the formation of nanolaminated Al100−zNiz/AlOxHy (bilayer period: 25/1 nm, z = 0, 2, and 5 at.%) thin films, introducing a novel interface-engineered design strategy with advanced microstructure control. This leverages dual-route tailoring of nanocrystalline Al through 1) compositional grain boundary engineering (Al100−zNiz) and 2) well-defined crystalline / amorphous interfaces (Al100−zNiz/AlOxHy). As ambient plasticity is thought to be governed by dislocation interactions with segregation-modified interfaces & lattice, elucidating the collective role of such barriers in strengthening is essential for establishing a robust design framework.
Accordingly, high-resolution analyses by scanning transmission electron microscopy (STEM) and atom probe tomography (APT) established a direct link between enhanced hardness and distinct nanostructural features. The nanolaminated Al95Ni5 / AlOxHy thin film here exhibits Ni-rich nanoclusters embedded in a sub-10 nm FCC Al matrix and smooth ∼1 nm amorphous interlayers. Notably, STEM indicated Ni decorating vertical Al grain boundaries, whereas APT reveals these to be distinct Ni-rich nanoclusters. Nanoindentation measurements confirmed hardness of 5.3 GPa for Al95Ni5/AlOxHy versus 2.7 GPa for Al/AlOxHy. Calculations showed that comparable strengthening magnitudes originate from both aspects of the dual-route tailored nanostructure: impeding dislocation motion by combined crystalline–amorphous layer confined slip and finely dispersed nanoclusters.

権利情報:

キーワード: Nanolaminated aluminium, Interface-engineering, Hybrid PVD-ALD, Nanoclusters, Crystalline/amorphous interface, Nanoindentation

刊行年月日: 2026-01-30

出版者: Elsevier BV

掲載誌:

  • Materials & Design (ISSN: 02641275) vol. 263 115580

研究助成金:

  • Japan Society for the Promotion of Science 24K23036
  • Deutsche Forschungsgemeinschaft 409476157
  • Deutsche Forschungsgemeinschaft SFB 1394
  • Innosuisse Swiss Innovation Agency 109.352.1

原稿種別: 出版者版 (Version of record)

MDR DOI:

公開URL: https://doi.org/10.1016/j.matdes.2026.115580

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更新時刻: 2026-04-10 18:08:28 +0900

MDRでの公開時刻: 2026-04-13 10:23:10 +0900

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