Mechanism of ion track formation in silicon by much lower energy deposition than the formation threshold

Journal article

Creator

H Amekura (author) (Search by this author)

https://orcid.org/0000-0003-2148-8431

National Institute for Materials Science

NIMS Researchers Directory SAMURAI

H Amekura ;

K Narumi (author) (Search by this author)

K Narumi ;

A Chiba (author) (Search by this author)

A Chiba ;

Y Hirano (author) (Search by this author)

Y Hirano ;

K Yamada (author) (Search by this author)

K Yamada ;

S Yamamoto (author) (Search by this author)

S Yamamoto ;

N Ishikawa (author) (Search by this author)

N Ishikawa ;

N Okubo (author) (Search by this author)

N Okubo ;

M Toulemonde (author) (Search by this author)

M Toulemonde ;

Y Saitoh (author) (Search by this author)

Y Saitoh

Keyword

C60 ion, ion track, swift heavy ion, silicon, synergy effect, track recrystallization

Date published

2023-04-01

Updated at

2024-01-05 22:12:20 +0900