HCl-gas etching of (001) β-Ga2O3 under oxygen supply

Journal article

Creator

Yuichi Oshima (author) (Search by this author)

https://orcid.org/0000-0001-8293-4891

Research Center for Electronic and Optical Materials/Functional Materials Field/Ultra-wide Bandgap Semiconductors Group, National Institute for Materials Science

NIMS Researchers Directory SAMURAI

Yuichi Oshima ;

Takayoshi Oshima (author) (Search by this author)

https://orcid.org/0000-0001-8550-9735

Research Center for Electronic and Optical Materials/Functional Materials Field/Ultra-wide Bandgap Semiconductors Group, National Institute for Materials Science

NIMS Researchers Directory SAMURAI

Takayoshi Oshima

Keyword

Ga2O3, etching, plasma-free

Date published

2025-12-31

Updated at

2025-09-04 12:30:19 +0900