Reliable Ohmic Contact Properties for Ni/Hydrogen-Terminated Diamond at Annealing Temperature up to 900 °C

Journal article

Creator

Xiaolu Yuan (author) (Search by this author)

Xiaolu Yuan ;

Jiangwei Liu (author) (Search by this author)

Jiangwei Liu ;

Jinlong Liu (author) (Search by this author)

https://orcid.org/0000-0003-2580-7401

National Institute for Materials Science

NIMS Researchers Directory SAMURAI

Jinlong Liu ;

Junjun Wei (author) (Search by this author)

Junjun Wei ;

Bo Da (author) (Search by this author)

https://orcid.org/0000-0002-0785-8662

National Institute for Materials Science

NIMS Researchers Directory SAMURAI

Bo Da ;

Chengming Li (author) (Search by this author)

Chengming Li ;

Yasuo Koide (author) (Search by this author)

https://orcid.org/0000-0001-8321-9822

National Institute for Materials Science

NIMS Researchers Directory SAMURAI

Yasuo Koide

Keyword

hydrogen-terminated diamond (H-diamond), ohmic contact, Ni, specific contact resistance, high-temperature

Date published

2021-04-17

Updated at

2024-01-05 22:12:52 +0900