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atomic layer deposition (1)
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From Mechanics to Electronics: Influence of ALD Interlayers on the Multiaxial Electro‐Mechanical Behavior of Metal–Oxide Bilayers
Journal article
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Johanna Byloff
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https://orcid.org/0000-0001-6026-6845
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Johanna Byloff
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Vivek Devulapalli
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https://orcid.org/0000-0002-1743-3246
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Vivek Devulapalli
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Daniele Casari
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https://orcid.org/0000-0003-2113-5070
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Daniele Casari
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Thomas E. J. Edwards
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https://orcid.org/0000-0002-3089-0062
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Thomas E. J. Edwards
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Claus O. W. Trost
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https://orcid.org/0000-0002-7570-688X
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Claus O. W. Trost
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Megan J. Cordill
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https://orcid.org/0000-0003-1142-8312
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Megan J. Cordill
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Shuhel Altaf Husain
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https://orcid.org/0000-0002-1080-565X
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Shuhel Altaf Husain
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Pierre‐Olivier Renault
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https://orcid.org/0000-0002-0736-2333
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Pierre‐Olivier Renault
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Damien Faurie
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https://orcid.org/0000-0001-7259-3958
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Damien Faurie
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Barbara Putz
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https://orcid.org/0000-0001-9687-6346
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Barbara Putz
Keyword
atomic layer deposition
,
electromechanical properties
,
flexible polymer substrates
,
tensile testing
,
thin films
Date published
2025-11-27
Updated at
2026-01-20 11:54:44 +0900
Keyword
atomic layer deposition
(1)
electromechanical properties
(1)
flexible polymer substrates
(1)
tensile testing
(1)
thin films
(1)
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