NF3 and F2 gas fluorination of GaN surface and Pt/GaN interface analyzed by hard X-ray photoelectron spectroscopy

Journal article

Creator

Asahiko Matsuda (author) (Search by this author)

https://orcid.org/0000-0001-5989-027X

National Institute for Materials Science

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Asahiko Matsuda ;

Takashi Teramoto (author) (Search by this author)

https://orcid.org/0000-0002-9368-1284 (unauthenticated)

Takashi Teramoto ;

Takahiro Nagata (author) (Search by this author)

https://orcid.org/0000-0002-8591-2943

National Institute for Materials Science

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Takahiro Nagata ;

Dominic Gerlach (author) (Search by this author)

https://orcid.org/0000-0003-1859-0750 (unauthenticated)

Dominic Gerlach ;

Peng Shen (author) (Search by this author)

https://orcid.org/0000-0002-1971-5490 (unauthenticated)

Peng Shen ;

Shigenori Ueda (author) (Search by this author)

https://orcid.org/0000-0001-9425-0614

National Institute for Materials Science

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Shigenori Ueda ;

Takako Kimura (author) (Search by this author)

Takako Kimura ;

Christian Dussarrat (author) (Search by this author)

Christian Dussarrat ;

Toyohiro Chikyow (author) (Search by this author)

https://orcid.org/0000-0003-3860-4806

NIMS Researchers Directory SAMURAI

Toyohiro Chikyow

Keyword

Fluorination, Surface passivation, hard X-ray photoelectron spectroscopy, Gallium nitride

Date published

2024-03-19

Updated at

2026-03-19 14:27:24 +0900