Self-aligned patterning on β-Ga2O3 substrates via backside-exposure photolithography

ジャーナル論文

著者

Takayoshi Oshima (author) (この著者で検索)

https://orcid.org/0000-0001-8550-9735

National Institute for Materials Science

NIMS Researchers Directory SAMURAI

Takayoshi Oshima

キーワード

Ga2O3, lithography

刊行年月日

2023-01-01

更新時刻

2024-01-24 11:20:15 +0900