Phase Identification of 850 nm Thick 7%YO_1.5–93%HfO₂ Films by Surface and Cross-Sectional Raman Spectroscopies

Journal article

Creator

Takanori Mimura (author) (Search by this author)

Takanori Mimura ;

Yuma Takahashi (author) (Search by this author)

Yuma Takahashi ;

Takahisa Shiraishi (author) (Search by this author)

Takahisa Shiraishi ;

Masanori Kodera (author) (Search by this author)

Masanori Kodera ;

Reijiro Shimura (author) (Search by this author)

Reijiro Shimura ;

Keisuke Ishihama (author) (Search by this author)

Keisuke Ishihama ;

Kazuki Okamoto (author) (Search by this author)

Kazuki Okamoto ;

Hiroki Moriwake (author) (Search by this author)

Hiroki Moriwake ;

Ayako Taguchi (author) (Search by this author)

Ayako Taguchi ;

Takao Shimizu (author) (Search by this author)

https://orcid.org/0000-0001-9508-7601

National Institute for Materials Science

NIMS Researchers Directory SAMURAI

Takao Shimizu ;

Yasuhiro Fujii (author) (Search by this author)

Yasuhiro Fujii ;

Akitoshi Koreeda (author) (Search by this author)

Akitoshi Koreeda ;

Hiroshi Funakubo (author) (Search by this author)

Hiroshi Funakubo

Keyword

Raman spectroscopy, field-induced phase transition, Multiple phase, HfO2-based ferroelectric film

Date published

2024-04-23

Updated at

2024-12-24 13:59:01 +0900