Download file (1.37MB)
Download as zip (1.09MB)

コレクション

引用

説明:

Magnetron sputtering inherently exhibits the advantage of dislodging particles from the target in a ratio
equivalent to the target stoichiometry. Nevertheless, film compositions often deviate due to element-dependent scattering with the working gas, necessitating the adjustment of the sputtering process. In this work, we explore an unconventional approach to addressing this issue, involving the employment of an off-stoichiometric target. The required composition is obtained through an iterative process, which is demonstrated by Fe2VAl and Fe2V0.9Ti0.1Al films as case studies. Ultimately, the correct stoichiometry is obtained from Fe1.86V1.15Al0.99 and Fe1.88V1.02Ti0.13Al0.97 targets, respectively. Despite the thermoelectric properties falling below expectations, mainly due to imperfect film crystallization, the strategy successfully achieved the desired stoichiometry, enabling accurate film synthesis without the need for advanced sputtering setups.

権利情報:

• In Copyright
  

  ©2024 American Physical Society

キーワード: thermoelectric

刊行年月日: 2024-09-25

出版者: American Physical Society (APS)

掲載誌:

• Physical Review Materials (ISSN: 24759953) vol. 8 issue. 9 095402

研究助成金:

• Japan Science and Technology Agency JPMJMI19A1

原稿種別: 査読前原稿 (Author's original)

MDR DOI: https://doi.org/10.48505/nims.4818

公開URL: https://doi.org/10.1103/physrevmaterials.8.095402

関連資料:

その他の識別子:

連絡先:

更新時刻: 2024-10-10 08:30:33 +0900

MDRでの公開時刻: 2024-10-10 08:30:33 +0900