Kenji Sakamoto
(National Institute for Materials Science)
;
Takeshi Yasuda
(National Institute for Materials Science)
;
Takeo Minari
(National Institute for Materials Science)
;
Masafumi Yoshio
(National Institute for Materials Science)
;
Junpei Kuwabara
;
Masayuki Takeuchi
(National Institute for Materials Science)
説明:
(abstract)The bias-stress effects of bottom-gate top-contact polymer-based OFETs with different channel lengths were evaluated by repeating cycles of prolonged on-state gate-bias application and transfer characteristics measurements in linear regime. The thicknesses of PQTBTz-C12 active layers were 26 and 37 nm. All OFETs exhibited nonlinear transfer characteristics with a maximum transconductance. Both a shift in threshold voltage and a reduction in field-effect charge carrier mobility were apparently observed during the bias-stress application. When mobility and threshold voltage were conventionally extracted from the transfer characteristics around the maximum transconductance, the threshold voltage shift amount and mobility reduction depended on the channel length and were smaller in OFETs with short channels. After contact resistance correction, the channel length dependence disappeared. Therefore, the operational stability in OFETs with short channels: ≦ 50 (150) μm for the 26 (37) nm-thick active layers, was found to be overestimated without contact resistance correction. This erroneous evaluation would become more pronounced in short-channel, high-mobility OFETs.
権利情報:
キーワード: polymer-based organic field-effect transistors, bias-stress effects, contact resistance, modified transmission line method, operational stability
刊行年月日: 2024-12-11
出版者: American Chemical Society (ACS)
掲載誌:
研究助成金:
原稿種別: 出版者版 (Version of record)
MDR DOI:
公開URL: https://doi.org/10.1021/acsami.4c15666
関連資料:
その他の識別子:
連絡先:
更新時刻: 2025-12-04 16:39:15 +0900
MDRでの公開時刻: 2025-12-04 16:23:47 +0900
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overestimation-of-operational-stability-in-polymer-based-organic-field-effect-transistors-caused-by-contact-resistance.pdf
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