Article H-Radical Reactive Infrared Laser Deposition of LiH: A Method for Growing High-Quality Metal Hydride Epitaxial Films

Kota Munefusa ; Erika Fukushi ORCID ; Takayuki Harada SAMURAI ORCID ; Hiroyuki Oguchi ORCID

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Kota Munefusa, Erika Fukushi, Takayuki Harada, Hiroyuki Oguchi. H-Radical Reactive Infrared Laser Deposition of LiH: A Method for Growing High-Quality Metal Hydride Epitaxial Films. Inorganic Chemistry. 2025, 64 (16), 7945-7950. https://doi.org/10.1021/acs.inorgchem.4c05449

Description:

(abstract)

We present a new film growth method designed specifically for growing metal hydride thin films that we name “H-radical reactive infrared laser deposition”. This approach leverages hydrogen radicals (H·) to achieve rapid and complete metal hydrogenation, leading to high-purity hydride phases. We demonstrate the effectiveness of this method through the growth of LiH epitaxial thin films, where the H· supply eliminates Li precipitates and enhances crystallinity. Additionally, the use of an infrared laser minimizes film–substrate reactions, reducing the level of impurity formation. To explore the material tunability of this method, we successfully controlled film orientation and achieved Mg doping in LiH. Our findings establish H-radical reactive infrared laser deposition as a promising method for fabricating high-quality metal hydride thin films with tailored properties.

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  • In Copyright

    This document is the unedited Author’s version of a Submitted Work that was subsequently accepted for publication in Inorganic Chemistry, copyright © 2025 American Chemical Society after peer review. To access the final edited and published work see https://doi.org/10.1021/acs.inorgchem.4c05449.

Keyword: Hydride, Thin films

Date published: 2025-04-28

Publisher: American Chemical Society (ACS)

Journal:

  • Inorganic Chemistry (ISSN: 00201669) vol. 64 issue. 16 p. 7945-7950

Funding:

  • Fujikura Foundation
  • Ministry of Education, Culture, Sports, Science and Technology 18H01727
  • Ministry of Education, Culture, Sports, Science and Technology 19K22225
  • Ministry of Education, Culture, Sports, Science and Technology 24K21249
  • Ministry of Education, Culture, Sports, Science and Technology 7K19 K22225
  • National Institute for Materials Science 2022-87
  • National Institute for Materials Science 2023-024
  • Iketani Science and Technology Foundation 0361115-A

Manuscript type: Author's version (Submitted manuscript)

MDR DOI: https://doi.org/10.48505/nims.5587

First published URL: https://doi.org/10.1021/acs.inorgchem.4c05449

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Updated at: 2025-07-14 16:30:24 +0900

Published on MDR: 2025-07-14 16:17:18 +0900

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