ジャーナル論文 Elucidating the improved properties of defect engineered lanthanum-doped nickel oxide as hole-transport layer in triple-cation perovskite solar cells
Vishnuvardhan Reddy Chappidi (author) (この著者で検索)
;
Sudhanshu Kumar Nayak (author) (この著者で検索)
;
Md. Emrul Kayesh (author) (この著者で検索)
National Institute for Materials Science
;
Md. Abdul Karim (author) (この著者で検索)
National Institute for Materials Science
;
Yulu He (author) (この著者で検索)
;
Ashraful Islam (author) (この著者で検索)
ORCID SAMURAI ;
Sai Santosh Kumar Raavi (author) (この著者で検索)
コレクション

引用
Vishnuvardhan Reddy Chappidi, Sudhanshu Kumar Nayak, Md. Emrul Kayesh, Md. Abdul Karim, Yulu He, Ashraful Islam, Sai Santosh Kumar Raavi. Elucidating the improved properties of defect engineered lanthanum-doped nickel oxide as hole-transport layer in triple-cation perovskite solar cells. Solar Energy. 2024, 281 (), 112888. https://doi.org/10.1016/j.solener.2024.112888

説明:

(abstract)

Charge recombination at the interface between the hole transport layer (HTL) and perovskite (PVK) has been a performance bottleneck for perovskite solar cells (PSCs). We present a detailed examination for the solar cell efficiency of the device using lanthanum (La)-doped nickel oxide (NiOx) as an HTL. The NiOx and La-doped NiOx films were prepared using the spray pyrolysis process. We employed low-temperature photoluminescence (LT-PL) to estimate the defect activation energy and utilized SCAPS 1D software to simulate the interface defect density. According to the data obtained, the interface between La: NiOx and PVK shows a lower activation energy for defects, indicating that it is more advantageous for charge transfer compared to the interface between NiOx and PVK. Utilizing SCAPS simulations the experimental JV curves closely match the simulated JV curves obtained from SCAPS simulations. These simulations were performed using optimal parameters, which involved increasing the Rsh values and reducing the interface density in La:NiOx based PSCs. The interface defect densities are estimated to be La:NiOx/PVK and NiOx/PVK interfaces are 1×1012 cm-2 and 1.7×1012 cm-2, respectively. This indicates ≈ 70 % reduction in defect density at the La:NiOx/PVK interface compared to the NiOx/PVK interface. The conductivity values obtained from linear sweep voltammetry (LSV) are 1.01×10-3 S cm-1 for NiOx films and 1.21×10-3 S cm-1 for La: NiOx films. This indicates a significant enhancement of ≈ 20 % in the conductivity of La: NiOx films compared to undoped films. This leads to improvements in VOC and ultimately enhances the PCE. The calculating defect density at the HTL/PVK interface can contribute to the fabrication of futuristic highly efficient PSCs.

権利情報:

キーワード: Defect Engineering, Perovskite Solar Cells, Lanthanum-Doped Nickel Oxide, Hole-Transport Layer

刊行年月日: 2024-08-29

出版者: Elsevier BV

掲載誌:

  • Solar Energy (ISSN: 0038092X) vol. 281 112888

研究助成金:

  • Department of Science and Technology

原稿種別: 著者最終稿 (Accepted manuscript)

MDR DOI: https://doi.org/10.48505/nims.5262

公開URL: https://doi.org/10.1016/j.solener.2024.112888

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更新時刻: 2026-08-29 08:30:04 +0900

MDRでの公開時刻: 2026-08-29 08:25:09 +0900

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