Article Thickness dependent spin to charge interconversion efficiency in polycrystalline BiSb layers deposited on Si substrate

Talluri Manoj ; Venkat Mattela ; Akshay Kumar Salimath ; Sanghamitra Debroy ; Tarun Raju Kakinada SAMURAI ORCID ; M. S. Devapriya ORCID ; Arabinda Haldar ORCID ; Zhenchao Wen SAMURAI ORCID ; Hiroaki Sukegawa SAMURAI ORCID ; Seiji Mitani SAMURAI ORCID ; Chandrasekhar Murapaka ORCID

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Citation
Talluri Manoj, Venkat Mattela, Akshay Kumar Salimath, Sanghamitra Debroy, Tarun Raju Kakinada, M. S. Devapriya, Arabinda Haldar, Zhenchao Wen, Hiroaki Sukegawa, Seiji Mitani, Chandrasekhar Murapaka. Thickness dependent spin to charge interconversion efficiency in polycrystalline BiSb layers deposited on Si substrate. Journal of Applied Physics. 2025, 138 (5), 053903. https://doi.org/10.1063/5.0280905

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(abstract)

The strong spin-orbit torque (SOT) generated by topological insulators (TIs) interfaced with ferromagnetic layers paves the path towards high-performance and low-power spintronic device applications. To date, large spin-to-charge or charge-to-spin conversion efficiency (ξ) of TIs is accomplished on high-quality epitaxially grown TI thin films on specifically oriented substrates. Moreover, the emergence of topological surface states (TSS) largely depends on the composition, which is hard to obtain on a large scale using sputtering growth. Here, we report a room-temperature ξ of BiSb/Py bilayer thin films with Titanium insertion (Ti) grown on Si substrates, which underlines the potential of BiSb for industrial applications and its adaptability to industrial-friendly processes. In this work, spin pumping and inverse spin Hall effect (ISHE) studies are performed on magnetron-sputtered BiSb(x)/Ti(x)/Py(10 nm) stacks by varying the thicknesses of BiSb and Ti insertion. The ξ has improved from 8 nm to 12 nm of BiSb in BiSb(x)/Ti(3 nm)/Py(10 nm) samples, and we found ξ of 3.71 in the BiSb(12 nm)/Ti(3 nm)/Py(10 nm) sample. This increasing trend in ξ with the thickness of BiSb is also consistently observed in spin-torque ferromagnetic resonance (ST-FMR) measurements. However, a decreasing trend in ξ was noted with the insertion layer thickness increased to 4 and 8 nm, underscoring the critical role of spacer layer thickness in determining ξ. Our results demonstrate the process involved in depositing a homogeneous BiSb layer directly on the Si substrate and the impact of the thickness of the insertion layer and BiSb on the ξ in topological material/ferromagnet bilayer systems. The relatively high ξ in TI grown on Si substrate paves the way for the development of low-power, high-speed CMOS-compatible novel spin-orbit torque devices.

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Keyword: Spin-charge interconversion, Polycrystalline BiSb, Thickness dependence

Date published: 2025-08-07

Publisher: AIP Publishing

Journal:

  • Journal of Applied Physics (ISSN: 00218979) vol. 138 issue. 5 053903

Funding:

  • JICA Friendship AC2023-7

Manuscript type: Author's version (Accepted manuscript)

MDR DOI: https://doi.org/10.48505/nims.5745

First published URL: https://doi.org/10.1063/5.0280905

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Updated at: 2025-09-10 16:30:20 +0900

Published on MDR: 2025-09-10 16:19:36 +0900

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