説明:
(abstract)Defects in wide band gap crystals have emerged as a promising platform for hosting color centers that enable quantum photonic applications. Among these, hexagonal boron nitride (hBN), a van der Waals material, stands out for its ability to be integrated into heterostructures, enabling unconventional charge injection mechanisms that bypass the need for p–n junctions. This advancement allows for the electrical excitation of hBN color centers deep inside the large hBN band gap, which has seen rapid progress in recent developments. Here, we fabricate hBN electroluminescence (EL) devices that generate narrowband color centers suitable for electrical excitation. The color centers are localized to tunneling current hotspots within the hBN flake, which are engineered during device fabrication. We outline the optimal conditions for device operation and color center stability, focusing on minimizing background emission and ensuring prolonged operation. Our findings follow up on the existing literature and mark a step forward toward the integration of hBN-based color centers into quantum photonic technologies.
権利情報:
This document is the Accepted Manuscript version of a Published Work that appeared in final form in ACS Applied Materials & Interfaces, copyright © 2025 American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see https://doi.org/10.1021/acsami.5c01642
キーワード: Hexagonal boron nitride, Color center, Electroluminescence
刊行年月日: 2025-04-23
出版者: American Chemical Society (ACS)
掲載誌:
研究助成金:
原稿種別: 著者最終稿 (Accepted manuscript)
MDR DOI:
公開URL: https://doi.org/10.1021/acsami.5c01642
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その他の識別子:
連絡先:
更新時刻: 2026-07-28 15:51:08 +0900
MDRでの公開時刻: 2026-07-28 18:26:55 +0900
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