Yosuke Sasama
;
Takuya Iwasaki
;
Mohammad Monish
;
Kenji Watanabe
;
Takashi Taniguchi
;
Yamaguchi Takahide
説明:
(abstract)Diamond electronic devices have garnered significant interest owing to their excellent semiconducting properties. We recently demonstrated that excluding surface-transfer doping results in enhanced carrier mobility and a normally off behavior in diamond field-effect transistors (FETs) with a hexagonal boron nitride (h-BN) gate insulator. In our previous study, the gate electrode was overlapped onto the source/drain electrodes to prevent the increase in access resistance caused by the exclusion of the surface-transfer doping. However, it is known that gate overlap increases parasitic capacitance and gate leak current. In this study, we developed a technique for self-aligning the gate electrode with the edge of h-BN using oblique-angle deposition. The diamond FET with self-aligned gate electrode exhibits optimal FET characteristics, including high mobility of ≈400 cm2V-1s-1, low sheet resistance of 2.4 kOhm, and output characteristics demonstrating pinch-off behavior. Furthermore, the capacitance-voltage characteristics clearly indicate distinct ON and OFF states, validating the efficacy of this technique. This method enables the fabrication of diamond/h-BN FETs with no gate overlap and without increasing the access resistance, making it promising approach for developing high-speed, low-loss diamond FETs with a wide application scope.
権利情報:
キーワード: Hydrogen-terminated diamond, Field-effect transistors, hexagonal boron nitride, Self-aligned gate electrode
刊行年月日: 2024-08-26
出版者: AIP Publishing
掲載誌:
研究助成金:
原稿種別: 著者最終稿 (Accepted manuscript)
MDR DOI: https://doi.org/10.48505/nims.4743
公開URL: https://doi.org/10.1063/5.0224192
関連資料:
その他の識別子:
連絡先:
更新時刻: 2024-09-12 16:30:45 +0900
MDRでの公開時刻: 2024-09-12 16:30:45 +0900
| ファイル名 | サイズ | |||
|---|---|---|---|---|
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AcceptedManuscript_Sasama_2024_APL24-AR-05220.pdf
(サムネイル)
application/pdf |
サイズ | 758KB | 詳細 |