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説明:

Oxide growth and O dissolution during the oxidation of an α-Ti alloy at 973 K were simulated using the finite volume method coupled with the CALPHAD method. The addition of 11.02% Al to a Ti–O system caused the formation of Al2O3 with a thickness of 18 nm, which suppressed the TiO2 growth and O dissolution in the substrate. An increase in the O concentration at the oxide/metal interface was inhibited by Al2O3 formation. A thin Al-depletion zone was formed at the oxide/metal interface. Al2O3 formation was restricted by the low content and slow diffusivity of Al in the substrate.

権利情報:

• Creative Commons BY Attribution 4.0 International
  

キーワード: Oxidation, Titanium alloy, Oxide growth, Oxygen dissolution, Kinetic modeling

刊行年月日: 2024-04-20

出版者: Elsevier BV

掲載誌:

• Journal of Materials Research and Technology (ISSN: 22387854) vol. 30 p. 4137-4146

研究助成金:

• Amada Foundation AF-2022215-B3

原稿種別: 出版者版 (Version of record)

MDR DOI:

公開URL: https://doi.org/10.1016/j.jmrt.2024.04.164

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更新時刻: 2024-09-30 16:30:30 +0900

MDRでの公開時刻: 2024-09-30 16:30:30 +0900