Tomonori Kitashima
(National Institute for Materials Science
)
;
Takanobu Hiroto
(National Institute for Materials Science
)
;
Makoto Watanabe
(National Institute for Materials Science
)
Description:
(abstract)Oxide growth and O dissolution during the oxidation of an α-Ti alloy at 973 K were simulated using the finite volume method coupled with the CALPHAD method. The addition of 11.02% Al to a Ti–O system caused the formation of Al2O3 with a thickness of 18 nm, which suppressed the TiO2 growth and O dissolution in the substrate. An increase in the O concentration at the oxide/metal interface was inhibited by Al2O3 formation. A thin Al-depletion zone was formed at the oxide/metal interface. Al2O3 formation was restricted by the low content and slow diffusivity of Al in the substrate.
Rights:
Keyword: Oxidation, Titanium alloy, Oxide growth, Oxygen dissolution, Kinetic modeling
Date published: 2024-04-20
Publisher: Elsevier BV
Journal:
Funding:
Manuscript type: Publisher's version (Version of record)
MDR DOI:
First published URL: https://doi.org/10.1016/j.jmrt.2024.04.164
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Updated at: 2024-09-30 16:30:30 +0900
Published on MDR: 2024-09-30 16:30:30 +0900
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968_Numerical analysis of Al2O3 and TiO2 growth and oxygen dissolution in a metal substrate during the isothermal oxidation of an α-Ti alloy at 973 K.pdf
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