Article Numerical analysis of Al2O3 and TiO2 growth and oxygen dissolution in a metal substrate during the isothermal oxidation of an α-Ti alloy at 973 K

Tomonori Kitashima SAMURAI ORCID (National Institute for Materials ScienceROR) ; Takanobu Hiroto SAMURAI ORCID (National Institute for Materials ScienceROR) ; Makoto Watanabe SAMURAI ORCID (National Institute for Materials ScienceROR)

968_Numerical analysis of Al2O3 and TiO2 growth and oxygen dissolution in a metal substrate during the isothermal oxidation of an α-Ti alloy at 973 K.pdf
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Tomonori Kitashima, Takanobu Hiroto, Makoto Watanabe. Numerical analysis of Al2O3 and TiO2 growth and oxygen dissolution in a metal substrate during the isothermal oxidation of an α-Ti alloy at 973 K. Journal of Materials Research and Technology. 2024, 30 (), 4137-4146.
SAMURAI

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(abstract)

Oxide growth and O dissolution during the oxidation of an α-Ti alloy at 973 K were simulated using the finite volume method coupled with the CALPHAD method. The addition of 11.02% Al to a Ti–O system caused the formation of Al2O3 with a thickness of 18 nm, which suppressed the TiO2 growth and O dissolution in the substrate. An increase in the O concentration at the oxide/metal interface was inhibited by Al2O3 formation. A thin Al-depletion zone was formed at the oxide/metal interface. Al2O3 formation was restricted by the low content and slow diffusivity of Al in the substrate.

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Keyword: Oxidation, Titanium alloy, Oxide growth, Oxygen dissolution, Kinetic modeling

Date published: 2024-04-20

Publisher: Elsevier BV

Journal:

  • Journal of Materials Research and Technology (ISSN: 22387854) vol. 30 p. 4137-4146

Funding:

  • Amada Foundation AF-2022215-B3

Manuscript type: Publisher's version (Version of record)

MDR DOI:

First published URL: https://doi.org/10.1016/j.jmrt.2024.04.164

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Updated at: 2024-09-30 16:30:30 +0900

Published on MDR: 2024-09-30 16:30:30 +0900