Wendong Wang
;
Nicholas Clark
;
Matthew Hamer
;
Amy Carl
;
Endre Tovari
;
Sam Sullivan-Allsop
;
Evan Tillotson
;
Yunze Gao
;
Hugo de Latour
;
Francisco Selles
;
James Howarth
;
Eli G. Castanon
;
Mingwei Zhou
;
Haoyu Bai
;
Xiao Li
;
Astrid Weston
;
Kenji Watanabe
(National Institute for Materials Science
)
;
Takashi Taniguchi
(National Institute for Materials Science
)
;
Cecilia Mattevi
;
Thomas H. Bointon
;
Paul V. Wiper
;
Andrew J. Strudwick
;
Leonid A. Ponomarenko
;
Andrey V. Kretinin
;
Sarah J. Haigh
;
Alex Summerfield
;
Roman Gorbachev
Description:
(abstract)Layer-by-layer assembly of van der Waals (vdW) heterostructures underpins new discoveries in solid state physics, material science and chemistry. Despite the successes, all current 2D material (2DM) transfer techniques rely on the use of polymers which limits the cleanliness, ultimate electronic performance, and their potential for optoelectronic applications of the heterostructures. In this letter, we present a novel polymer-free platform for rapid and facile heterostructure assembly which utilises flexible silicon nitride membranes. Our technology allows for vdW heterostructure assembly at high temperatures >600°C, various solvents and in ultra-high vacuum (UHV), making it suitable for industrial scale-up. We demonstrate that this allows the production of 2D heterostructures with perfect interfaces free from interlayer contamination and correspondingly excellent electronic behaviour. The UHV transfer synthesis approach employed here for the first time, can reliably create graphene moiré superlattices with over an order of magnitude improvement in their structural homogeneity. This technology opens up a potential avenue for industry-compatible manufacturing of vdW heterostructures.
Rights:
Keyword: Van der Waals heterostructures, polymer-free technique, twisted-graphene
Date published: 2023-12-05
Publisher: Springer Science and Business Media LLC
Journal:
Funding:
Manuscript type: Publisher's version (Version of record)
MDR DOI:
First published URL: https://doi.org/10.1038/s41928-023-01075-y
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Other identifier(s):
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Updated at: 2025-02-23 22:48:10 +0900
Published on MDR: 2025-02-23 22:48:10 +0900
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