Kirill Bulgarevich
(National Institute for Materials Science)
;
Kenji Sakamoto
(National Institute for Materials Science)
;
Takeshi Yasuda
(National Institute for Materials Science)
;
Takeo Minari
(National Institute for Materials Science)
;
Masayuki Takeuchi
(National Institute for Materials Science)
説明:
(abstract)Bias-stress resistance of polymer-based organic field-effect transistors (OFETs) is considerably enhanced by coating the gate dielectric surface with an amorphous perfluoropolymer (CYTOP). In bottom-gate (BG) OFETs offering a relatively simple fabrication process, the CYTOP coating causes a serious problem; that is, thin film formation of organic semiconducting polymers generally fails due to the lyophobic properties of CYTOP. This problem is solved by patterning the CYTOP coating layer with suitable designs. Here, a simple photo-patterning method is established using CYTOP terminated with amidosilyl functional groups. This method is composed of self-limited thinning process of CYTOP coating layers, exposure to vacuum ultraviolet light through a photomask, and development. BG/top-contact OFET arrays are fabricated using poly(2,5-bis(3-hexadecylthiophene-2-yl)thieno[3,2-b]thiophene) as the semiconducting polymer. The initial electrical properties and bias-stress resistance are compared with those of OFETs with octadecyltrichlorosilane (ODTS)-treated gate dielectrics. The CYTOP- and ODTS-OFETs show approximately the same initial electrical properties with very small device-to-device variation, while the CYTOP-OFETs exhibit much higher intrinsic bias-stress resistance. Therefore, the spin-coating combined with the simple photo-patterning method is a promising technique that can form polymeric organic semiconductor layers on CYTOP layers and produce BG OFETs exhibiting very high operational stability.
権利情報:
キーワード: organic field-effect transistors, polymeric organic semiconductors, hydrophobic-hydrophilic patterns, bias-stress resistance, amorphous perfluoropolymers
刊行年月日: 2020-06-09
出版者: Wiley
掲載誌:
研究助成金:
原稿種別: 著者最終稿 (Accepted manuscript)
MDR DOI: https://doi.org/10.48505/nims.5074
公開URL: https://doi.org/10.1002/aelm.202000161
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更新時刻: 2024-12-03 16:30:45 +0900
MDRでの公開時刻: 2024-12-03 16:30:46 +0900
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