Yura Maeda
;
Kosuke Imamura
;
Mitsuru Ohtake
;
Shinji Isogami
(National Institute for Materials Science
)
;
Tetsuroh Kawai
;
Masaaki Futamoto
;
Fumiyoshi Kirino
;
Nobuyuki Inaba
Description:
(abstract)An Fe4N(110) single-crystal film of 50 nm thickness with γʹ phase is prepared through hetero-epitaxial growth on an MgO(110) single-crystal substrate at 400 ◦C by reactive sputtering. The out-of-plane and in-plane lattice constants agree with those of bulk within small differences less than 0.2% and the orientation dispersions are about 1.2◦. The degree of N site ordering in Fe4N structure is estimated to be 0.995. The arithmetical mean surface roughness is as small as 0.3 nm. These data show that a high-quality Fe4N single-crystal film is successfully formed. The Fe4N film shows in-plane magnetic anisotropy with the easy magnetization direction parallel to [001] and with the hard direction parallel to [1-11], which is reflecting the positive magnetocrystalline anisotropy, K_1. A large negative λ_100 value of –40 ×10^–6 and a fairly-large positive λ_111 value of +150 ×10^–6 are observed. The present study has shown that γʹ-Fe4N compound is one of the strong candidates for rare-metal-free magnetostrictive materials.
Rights:
Keyword: Fe4N compound, Large magnetostriction, Single-crystal thin film, γ' phase
Date published: 2023-06-30
Publisher: Elsevier BV
Journal:
Funding:
Manuscript type: Author's version (Accepted manuscript)
MDR DOI: https://doi.org/10.48505/nims.5064
First published URL: https://doi.org/10.1016/j.jmmm.2023.170942
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Updated at: 2024-12-02 11:15:47 +0900
Published on MDR: 2025-06-30 08:18:02 +0900
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