Akihiro Shimada
;
Haruna Shiomi
;
Tetsuya Tohei
;
Yusuke Hayashi
;
Masaya Yamaguchi
;
Junpei Yamamoto
;
Takeaki Hamachi
;
Yasuhiko Imai
;
Kazushi Sumitani
;
Shigeru Kimura
;
Shota Kaneki
;
Tamotsu Hashizume
;
Akira Sakai
Description:
(abstract)We combined synchrotron radiation nanobeam X-ray diffraction technique with the pump-probe method to perform in-situ measurements of local strain in a normally-ON AlGaN/GaN metal-oxide-semiconductor high electron mobility transistor device under transistor operation. The c-axis strain in the AlGaN barrier layer within the gate region exhibited a clear position dependence, increasing as the gate voltage was increased in the negative direction and as the measurement position moved from the center of the gate electrode towards the drain-side gate edge. Based on the characteristics of the measured c-axis and a-axis strains, we successfully extracted not only the strain component due to the inverse piezoelectric effect but also the thermal expansion strain component, using the constitutive equation for elastic bodies.
Rights:
Keyword: GaN, HEMT, Strain, In situ
Date published: 2025-08-21
Publisher: AIP Publishing
Journal:
Funding:
Manuscript type: Author's version (Accepted manuscript)
MDR DOI: https://doi.org/10.48505/nims.5662
First published URL: https://doi.org/10.1063/5.0275921
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Updated at: 2025-08-23 08:30:23 +0900
Published on MDR: 2025-08-23 08:17:05 +0900
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