Satoshi Ishii
;
Anjaneyulu Oruganti
;
Ilario Bisignano
;
Hideki Abe
Description:
(abstract)Metals and dielectrics are essential components in photoelectric conversions and plasmonics. In these applications, basically any materials with negative and positive permittivities can be used as metals and dielectrics, respectively. Although there are many possible combinations of metallic and dielectric materials, they usually consist of different elements, making it challenging to create metal-dielectric interfaces from materials with identical elements. In this study, metallic and dielectric zirconium nitrides (Zr-N) are fabricated by controlling the flow rates of argon and nitrogen. Characterization by X-ray photoemission spectroscopy and X-ray diffraction reveals that the metallic and dielectric phases are ZrN and Zr3N4, respectively. The photoresponse is demonstrated by constructing a metal–insulator–metal structure using metallic and dielectric Zr-N thin films. Fabricating plasmonic nanostructures in Zr-N thin films can potentially improve the photoresponse. Additionally, other transition metal nitrides are also candidates for realizing metallic and dielectric components with the same constituent elements.
Rights:
This document is the Accepted Manuscript version of a Published Work that appeared in final form in CS Applied Optical Materials, copyright © 2025 American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see https://doi.org/10.1021/acsaom.4c00453.
Keyword: Zirconium Nitride, Plasmonic ceramic, Photocurrent, Sputtering
Date published: 2025-02-28
Publisher: American Chemical Society (ACS)
Journal:
Funding:
Manuscript type: Author's version (Accepted manuscript)
MDR DOI: https://doi.org/10.48505/nims.5462
First published URL: https://doi.org/10.1021/acsaom.4c00453
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Updated at: 2026-02-17 12:31:04 +0900
Published on MDR: 2026-02-17 09:11:03 +0900
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