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説明:

Metals and dielectrics are essential components in photoelectric conversions and plasmonics. In these applications, basically any materials with negative and positive permittivities can be used as metals and dielectrics, respectively. Although there are many possible combinations of metallic and dielectric materials, they usually consist of different elements, making it challenging to create metal-dielectric interfaces from materials with identical elements. In this study, metallic and dielectric zirconium nitrides (Zr-N) are fabricated by controlling the flow rates of argon and nitrogen. Characterization by X-ray photoemission spectroscopy and X-ray diffraction reveals that the metallic and dielectric phases are ZrN and Zr3N4, respectively. The photoresponse is demonstrated by constructing a metal–insulator–metal structure using metallic and dielectric Zr-N thin films. Fabricating plasmonic nanostructures in Zr-N thin films can potentially improve the photoresponse. Additionally, other transition metal nitrides are also candidates for realizing metallic and dielectric components with the same constituent elements.

権利情報:

• In Copyright
  This document is the Accepted Manuscript version of a Published Work that appeared in final form in CS Applied Optical Materials, copyright © 2025 American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see https://doi.org/10.1021/acsaom.4c00453.

キーワード: Zirconium Nitride, Plasmonic ceramic, Photocurrent, Sputtering

刊行年月日: 2025-02-28

出版者: American Chemical Society (ACS)

掲載誌:

• ACS Applied Optical Materials (ISSN: 27719855) vol. 3 issue. 2 p. 313-318

研究助成金:

• Japan Society for the Promotion of Science 22H01917
• Fusion Oriented REsearch for disruptive Science and Technology JPMJFR2139

原稿種別: 著者最終稿 (Accepted manuscript)

MDR DOI: https://doi.org/10.48505/nims.5462

公開URL: https://doi.org/10.1021/acsaom.4c00453

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更新時刻: 2026-02-17 12:31:04 +0900

MDRでの公開時刻: 2026-02-17 09:11:03 +0900