Elena Blundo
;
Federico Tuzi
;
Marzia Cuccu
;
Michele Re Fiorentin
;
Giorgio Pettinari
;
Atanu Patra
;
Salvatore Cianci
;
Zakhar R. Kudrynskyi
;
Marco Felici
;
Takashi Taniguchi
(National Institute for Materials Science)
;
Kenji Watanabe
(National Institute for Materials Science)
;
Amalia Patanè
;
Maurizia Palummo
;
Antonio Polimeni
Description:
(abstract)Two-dimensional crystals stack together through weak van der Waals (vdW) forces, offering unlim- ited possibilities to play with layer number, order and twist angle in vdW heterostructures (HSs). The realisation of high-performance optoelectronic devices, however, requires the achievement of specific band alignments, k-space matching between conduction band minima and valence band maxima, as well as efficient charge transfer between the constituent layers. Fine tuning mecha- nisms to design ideal HSs are lacking. Here we show that layer selective strain engineering can be exploited as an extra degree of freedom in vdW HSs, to engineer the band alignment and optical properties. To that end, strain is selectively applied to MS2 (M=Mo,W) monolayers in InSe/MS2 HSs. Indeed, InSe exhibits exceptional transport properties and thickness-tunable band gap ranging from near UV to near IR. However, it is characterised by a relatively weak photoluminescence (PL) efficiency. The application of strain to MS2 monolayers in InSe/MS2 HSs triggers a giant PL en- hancement of InSe, by two orders of magnitude. Resonant PL excitation measurements, supported by first-principle calculations, provide evidence of direct charge transfer from the strained MS2 MLs toward InSe. This significant PL enhancement achieved for InSe widens its range of applications for optoelectronics.
Rights:
Keyword: van der Waals heterostructures , strain engineering , photoluminescence enhancement
Date published: 2025-03-05
Publisher: American Chemical Society (ACS)
Journal:
Funding:
Manuscript type: Publisher's version (Version of record)
MDR DOI:
First published URL: https://doi.org/10.1021/acs.nanolett.4c04252
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Updated at: 2026-03-03 08:30:04 +0900
Published on MDR: 2026-03-02 17:20:29 +0900
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