Hitesh Agarwal
;
Bernat Terrés
;
Lorenzo Orsini
;
Alberto Montanaro
;
Vito Sorianello
;
Marianna Pantouvaki
;
Kenji Watanabe
(National Institute for Materials Science
)
;
Takashi Taniguchi
(National Institute for Materials Science
)
;
Dries Van Thourhout
;
Marco Romagnoli
;
Frank H. L. Koppens
Description:
(abstract)Electro-absorption (EA) waveguide-coupled modulators are essential building blocks for on-chip optical communications. Compared to state-of-the-art silicon (Si) devices, graphene- based EA modulators promise smaller footprints, larger temperature stability, cost-effective inte- gration and high speeds. However, combining high speed and large modulation efficiencies in a single graphene-based device has remained elusive so far. In this work, we overcome this fundamental trade-off by demonstrating the first 2D-3D dielectric integration in a high-quality encapsulated graphene device. We integrated hafnium oxide (HfO2 ) and two-dimensional (2D) hexagonal boron nitride (hBN) within the insulating section of a double-layer (DL) graphene EA modulator. This novel combination of materials allows for a high-quality modulator device with record high performance: bandwidth (BW) beyond 40GHz with a three-fold increase in modulation efficiency compared to previously reported high-speed modulators. This first demonstration of 2D-3D integration paves the way to a pletora of electronic and opto-electronic devices with enhanced performance and stability, while expanding the freedom for device design.
Rights:
Keyword: Electro-absorption modulators, graphene, high speed modulator
Date published: 2021-02-16
Publisher: Springer Science and Business Media LLC
Journal:
Funding:
Manuscript type: Publisher's version (Version of record)
MDR DOI:
First published URL: https://doi.org/10.1038/s41467-021-20926-w
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Updated at: 2025-02-28 08:30:41 +0900
Published on MDR: 2025-02-28 08:30:42 +0900
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