Hitoshi Yamaoka
;
Patrik Thunström
;
Naohito Tsujii
;
Masashi Arita
;
Eike F. Schwier
;
Kenya Shimada
;
Hirofumi Ishii
;
Nozomu Hiraoka
Description:
(abstract)Electronic structure of the intermediate valence systems Yb3Si5 and Yb3Ge5 were investigated by using high resolution x-ray absorption spectroscopy, resonant x-ray emission spectroscopy, and photoelectron spectroscopy. XAS and RXES revealed that the Yb valence in Yb3Si5 decreased monotonically with decreasing temperature. In contrast, in Yb3Ge5, it remained nearly divalent and exhibits little temperature dependence. The experimental valence-band spectra were further compared with the density of states calculations performed using the local density approximation plus dynamical mean-field theory (LDA+DMFT).
Rights:
Keyword: Yb compound, valence, X-ray absorption, Photoelectron spectroscopy, Pressure
Date published: 2025-07-15
Publisher: Physical Society of Japan
Journal:
Funding:
Manuscript type: Publisher's version (Version of record)
MDR DOI:
First published URL: https://doi.org/10.7566/jpsj.94.074709
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Updated at: 2025-11-13 08:30:24 +0900
Published on MDR: 2025-11-13 08:22:03 +0900
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