Hitoshi Yamaoka
;
Patrik Thunström
;
Naohito Tsujii
;
Masashi Arita
;
Eike F. Schwier
;
Kenya Shimada
;
Hirofumi Ishii
;
Nozomu Hiraoka
説明:
(abstract)Electronic structure of the intermediate valence systems Yb3Si5 and Yb3Ge5 were investigated by using high resolution x-ray absorption spectroscopy, resonant x-ray emission spectroscopy, and photoelectron spectroscopy. XAS and RXES revealed that the Yb valence in Yb3Si5 decreased monotonically with decreasing temperature. In contrast, in Yb3Ge5, it remained nearly divalent and exhibits little temperature dependence. The experimental valence-band spectra were further compared with the density of states calculations performed using the local density approximation plus dynamical mean-field theory (LDA+DMFT).
権利情報:
キーワード: Yb compound, valence, X-ray absorption, Photoelectron spectroscopy, Pressure
刊行年月日: 2025-07-15
出版者: Physical Society of Japan
掲載誌:
研究助成金:
原稿種別: 出版者版 (Version of record)
MDR DOI:
公開URL: https://doi.org/10.7566/jpsj.94.074709
関連資料:
その他の識別子:
連絡先:
更新時刻: 2025-11-13 08:30:24 +0900
MDRでの公開時刻: 2025-11-13 08:22:03 +0900
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2025_Yamaoka_Yb3Si5_JPSJ.pdf
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サイズ | 8.16MB | 詳細 |