Hirokazu Sasaki
;
Syunta Akiya
;
Kuniteru Mihara
;
Yojiro Oba
;
Masato Onuma
;
Jun Uzuhashi
(National Institute for Materials Science
)
;
Tadakatsu Ohkubo
(National Institute for Materials Science
)
Description:
(abstract)The strength of Cu-Ni-Si alloy can be improved by finely dispersing Ni-Si-based compounds as precipitates into the Cu matrix through heat treatment. To investigate the strengthening effect of the precipitate, quantitative evaluation of the size distribution and dispersion state is necessary. In this work, we utilized transmission electron microscopy, small-angle X-ray scattering (SAXS), small-angle neutron scattering (SANS), and atom probe tomography (APT) to analyze these Ni-Si precipitates. The APT results showed two types of diffusion layers at the interface between the Cu matrix and precipitates. The alloy contrast variation method based on the difference in SAXS and SANS intensity in absolute units also suggests that the δNi2Si precipitates are distorted.
Rights:
© 2024 Journal of Japan Institute of Copper
Keyword: atom probe tomography
Date published: 2025-01-01
Publisher: Japan Institute of Metals
Journal:
Funding:
Manuscript type: Publisher's version (Version of record)
MDR DOI:
First published URL: https://doi.org/10.2320/matertrans.mt-d2024005
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Updated at: 2025-01-08 16:31:18 +0900
Published on MDR: 2025-01-08 16:31:19 +0900
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