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説明:

The strength of Cu-Ni-Si alloy can be improved by finely dispersing Ni-Si-based compounds as precipitates into the Cu matrix through heat treatment. To investigate the strengthening effect of the precipitate, quantitative evaluation of the size distribution and dispersion state is necessary. In this work, we utilized transmission electron microscopy, small-angle X-ray scattering (SAXS), small-angle neutron scattering (SANS), and atom probe tomography (APT) to analyze these Ni-Si precipitates. The APT results showed two types of diffusion layers at the interface between the Cu matrix and precipitates. The alloy contrast variation method based on the difference in SAXS and SANS intensity in absolute units also suggests that the δNi2Si precipitates are distorted.

権利情報:

• In Copyright
  © 2024 Journal of Japan Institute of Copper

キーワード: atom probe tomography

刊行年月日: 2025-01-01

出版者: Japan Institute of Metals

掲載誌:

• MATERIALS TRANSACTIONS (ISSN: 13475320) vol. 66 issue. 1 p. 44-49 MT-D2024005

研究助成金:

原稿種別: 出版者版 (Version of record)

MDR DOI:

公開URL: https://doi.org/10.2320/matertrans.mt-d2024005

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更新時刻: 2025-01-08 16:31:18 +0900

MDRでの公開時刻: 2025-01-08 16:31:19 +0900