Journal article Atomic-scale investigation of implanted Mg in GaN through ultra-high-pressure annealing
Jun Uzuhashi (author) (Search by this author)
ORCID SAMURAI ;
Jun Chen (author) (Search by this author)
ORCID SAMURAI ;
Ashutosh Kumar (author) (Search by this author)
ORCID https://orcid.org/0000-0002-8085-1598 (unauthenticated)
National Institute for Materials Science
ORCID ;
Wei Yi (author) (Search by this author)
ORCID https://orcid.org/0000-0001-5040-8416 (unauthenticated)
National Institute for Materials Science
ORCID ;
Tadakatsu Ohkubo (author) (Search by this author)
ORCID SAMURAI ;
Ryo Tanaka (author) (Search by this author)
;
Shinya Takashima (author) (Search by this author)
;
Masaharu Edo (author) (Search by this author)
;
Kacper Sierakowski (author) (Search by this author)
;
Michal Bockowski (author) (Search by this author)
;
Hideki Sakurai (author) (Search by this author)
;
Tetsu Kachi (author) (Search by this author)
;
Takashi Sekiguchi (author) (Search by this author)
ORCID https://orcid.org/0000-0002-7365-9979 (unauthenticated)
National Institute for Materials Science
ORCID ;
Kazuhiro Hono (author) (Search by this author)
ORCID SAMURAI
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Citation
Jun Uzuhashi, Jun Chen, Ashutosh Kumar, Wei Yi, Tadakatsu Ohkubo, Ryo Tanaka, Shinya Takashima, Masaharu Edo, Kacper Sierakowski, Michal Bockowski, Hideki Sakurai, Tetsu Kachi, Takashi Sekiguchi, Kazuhiro Hono. Atomic-scale investigation of implanted Mg in GaN through ultra-high-pressure annealing. JOURNAL OF APPLIED PHYSICS. 2022, 131 (18), 185701-185701. https://doi.org/10.1063/5.0087248
SAMURAI

Description:

(abstract)

An area selective doping via ion implantation is a key technology to realize gallium nitride (GaN) based energy-efficient power devices; however, conventional annealing leads to the formation of numerous Mg-enriched defects, which results in inefficient p-type activation. Recent invention of ultra-high-pressure annealing (UHPA) has enabled a significant improvement of p-type activation efficiency. In this study, we investigated the formation of Mg-enriched defects in Mg implanted GaN followed by annealing under both conventional atmospheric pressure and ultra-high-pressure. Unlike the conventional annealing, UHPA leads to much lower number density of Mg-enriched defects. Correlative scanning transmission electron microscopy (STEM), atom probe tomography (APT), cathodoluminescence (CL) and secondary ion mass spectrometry (SIMS) analyses have shown that the number density of Mg-enriched defects are substantially suppressed by the UHPA. The dissolved Mg concentrations in the GaN matrix for both the conventional and the UHPA samples are almost at the same value, approximately 2 × 1018 cm-3; however, the UHPA sample shows over one order of magnitude stronger intensity of donor-acceptor-pair (DAP) emission than the conventional one. Thus, the implanted Mg is effectively activated as acceptors through the UHPA technique.

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Keyword: gallium nitride, implantation, atom probe tomography, cathodoluminescence, scanning transmission electron microscopy

Date published: 2022-05-14

Publisher: AIP Publishing

Journal:

  • JOURNAL OF APPLIED PHYSICS (ISSN: 00218979) vol. 131 issue. 18 p. 185701-185701

Funding:

Manuscript type: Author's version (Accepted manuscript)

MDR DOI: https://doi.org/10.48505/nims.4209

First published URL: https://doi.org/10.1063/5.0087248

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Updated at: 2024-01-05 22:11:22 +0900

Published on MDR: 2023-07-04 13:30:13 +0900

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