Journal article Improved Optical Uniformity of WSe 2 /WS 2 Moiré Superlattices Grown on hBN toward Quantum Photonics
Yui Tamogami (author) (Search by this author)
ORCID ;
Wenjin Zhang (author) (Search by this author)
;
Ryotaro Sakakibara (author) (Search by this author)
ORCID ; ORCID SAMURAI ;
Sudhanshu Kumar Nayak (author) (Search by this author)
;
Yusuke Nakanishi (author) (Search by this author)
; ORCID SAMURAI ; ORCID SAMURAI ; ORCID SAMURAI ;
Yasumitsu Miyata (author) (Search by this author)
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Citation
Yui Tamogami, Wenjin Zhang, Ryotaro Sakakibara, Yuto Urano, Sudhanshu Kumar Nayak, Yusuke Nakanishi, Kenji Watanabe, Takashi Taniguchi, Ryo Kitaura, Yasumitsu Miyata. Improved Optical Uniformity of WSe 2 /WS 2 Moiré Superlattices Grown on hBN toward Quantum Photonics. ACS Applied Nano Materials. 2026, 9 (19), 8572-8578. https://doi.org/10.1021/acsanm.6c00104

Description:

(abstract)

Chemical vapor deposition growth offers advantages for producing large-area moiré superlattices with controlled lattice alignment. However, the use of conventional SiO2/Si substrates often induces inhomogeneous lattice strain that obscures their optical properties. In this work, we report the improved uniformity of WSe2/WS2 moiré superlattices directly grown on hexagonal boron nitride (hBN). The hBN-supported samples exhibit well-ordered moiré structures as confirmed by transmission electron microscopy. At low temperatures, they show interlayer exciton peaks that are highly sensitive to excitation power, with a blueshift rate of ∼120 meV/μW, nearly 2 orders of magnitude larger than previously reported. This pronounced shift indicates the enhanced repulsive dipolar interaction of interlayer excitons confined in the moiré potential of WSe2/WS2 heterobilayers, enabled by the reduction of inhomogeneous strain and interlayer disorder on hBN. These results highlight the potential of directly grown moiré superlattices on hBN for quantum dot arrays, offering a route toward quantum photonics.

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Keyword: WSe2/WS2, Moiré Superlattices

Date published: 2026-05-15

Publisher: American Chemical Society (ACS)

Journal:

  • ACS Applied Nano Materials (ISSN: 25740970) vol. 9 issue. 19 p. 8572-8578

Funding:

  • JSPS JP21H05232, JP21H05234, JP22H04957, JP22H00280, JP24H00044, and JP23H02052
  • JST JPMJFR213X, JPMJCR23A4, JPMJCR24A5

Manuscript type: Publisher's version (Version of record)

MDR DOI:

First published URL: https://doi.org/10.1021/acsanm.6c00104

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Updated at: 2026-06-09 13:09:25 +0900

Published on MDR: 2026-06-09 15:25:34 +0900

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