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Van der Waals heterostructures are an excellent platform for studying intriguing physical phenomena at the interface between different layers. Because of their high sensitivity to surface contamination, surface science techniques such as scanning tunneling microscopy (STM) have so far been hampered in the study of such heterostructures. Here, we report a technique for assembling van der Waals heterostructures that intrinsically avoids polymer residues and can therefore be made solvent-free, requires no polymer melting and is thus also adaptable to vacuum conditions, and finally does usually not require protective layers. Our suspended pick-up and flip-over technique allows the assembly of arbitrarily complex heterostructures with residue-free interfaces, including the surface at the top of the stack. By performing atomic force microscopy (AFM) and atomically resolved low temperature STM, we show that the resulting heterostructures indeed have ultra-clean interfaces and that no surface degradation occurs.

Rights:

• Creative Commons BY Attribution 4.0 International
  

Keyword: van der Waals heterostructures
, atomically clean interfaces
, dry assembly technique

Date published: 2023-10-27

Publisher: Wiley

Journal:

• Advanced Materials Interfaces (ISSN: 21967350) vol. 11 issue. 1 2300658

Funding:

• Deutsche Forschungsgemeinschaft 2244
• Deutsche Forschungsgemeinschaft 443416235
• Deutsche Forschungsgemeinschaft 422707584
• Deutsche Forschungsgemeinschaft TE833/2‐1

Manuscript type: Publisher's version (Version of record)

MDR DOI:

First published URL: https://doi.org/10.1002/admi.202300658

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Updated at: 2026-02-09 16:30:05 +0900

Published on MDR: 2026-02-09 12:49:05 +0900