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説明:

Van der Waals heterostructures are an excellent platform for studying intriguing physical phenomena at the interface between different layers. Because of their high sensitivity to surface contamination, surface science techniques such as scanning tunneling microscopy (STM) have so far been hampered in the study of such heterostructures. Here, we report a technique for assembling van der Waals heterostructures that intrinsically avoids polymer residues and can therefore be made solvent-free, requires no polymer melting and is thus also adaptable to vacuum conditions, and finally does usually not require protective layers. Our suspended pick-up and flip-over technique allows the assembly of arbitrarily complex heterostructures with residue-free interfaces, including the surface at the top of the stack. By performing atomic force microscopy (AFM) and atomically resolved low temperature STM, we show that the resulting heterostructures indeed have ultra-clean interfaces and that no surface degradation occurs.

権利情報:

• Creative Commons BY Attribution 4.0 International
  

キーワード: van der Waals heterostructures
, atomically clean interfaces
, dry assembly technique

刊行年月日: 2023-10-27

出版者: Wiley

掲載誌:

• Advanced Materials Interfaces (ISSN: 21967350) vol. 11 issue. 1 2300658

研究助成金:

• Deutsche Forschungsgemeinschaft 2244
• Deutsche Forschungsgemeinschaft 443416235
• Deutsche Forschungsgemeinschaft 422707584
• Deutsche Forschungsgemeinschaft TE833/2‐1

原稿種別: 出版者版 (Version of record)

MDR DOI:

公開URL: https://doi.org/10.1002/admi.202300658

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更新時刻: 2026-02-09 16:30:05 +0900

MDRでの公開時刻: 2026-02-09 12:49:05 +0900