Citation Formats

Yoshikawa, Hideki, Ogiwara, Toshiya, Nagata, Takahiro. "Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam". Journal of Surface Analysis. 24, no. 3. . (2018): https://doi.org/10.1384/jsa.24.192