Citation Formats
Yoshikawa, Hideki, Ogiwara, Toshiya, Nagata, Takahiro.
"Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam".
Journal of Surface Analysis. 24, no. 3. .
(2018):
https://doi.org/10.1384/jsa.24.192